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極端紫外線露光(EUVL)システム市場:装置別(光源、ミラー、マスク、その他)、光源別(レーザー生成プラズマ(LPP)、真空スパーク、ガス放電)。世界の機会分析および産業予測、2021-2031年


Extreme Ultraviolet Lithography (EUVL) Systems Market By Equipment (Light Source, Mirrors, Mask, Others), By Light Source (Laser Produced Plasmas (LPP), Vacuum Sparks, Gas Discharges): Global Opportunity Analysis and Industry Forecast, 2021-2031

極端紫外線リソグラフィ装置市場は、2021年に80億4000万ドル、2031年には770億7000万ドルに達し、2022年から2031年までのCAGRは25.1%と予測される。極端紫外線リソグラフィは、反射型フォトマスクに紫外線を照射... もっと見る

 

 

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サマリー

極端紫外線リソグラフィ装置市場は、2021年に80億4000万ドル、2031年には770億7000万ドルに達し、2022年から2031年までのCAGRは25.1%と予測される。極端紫外線リソグラフィは、反射型フォトマスクに紫外線を照射し、フォトレジストで覆われた基板に反射させることでデザインを生成する光リソグラフィプロセスである。

EUVL装置市場の成長は、他のリソグラフィ技術に対する技術的優位性と、マイクロエレクトロニクス機器の販売増が主な要因となっています。さらに、電子機器の小型化に対する要求が高まっていることも、市場の成長を後押しすると予想されています。しかし、適切なフォトレジストを開発することの複雑さや、完璧なマスクを作ることの難しさが、市場の主な抑制要因となっています。逆に、Internet of Thingsのトレンドの高まりは、予測期間中にEUVLシステム市場の拡大に有利な機会を提供すると予想されます。

極端紫外線リソグラフィ装置市場は、装置、光源、地域によって区分される。装置ベースでは、市場は光源、ミラー、ヘルメット、その他に分けられる。光源に基づくと、市場はレーザー生成プラズマ(LPP)、真空スパーク、ガス放電に二分される。地域別では、北米(米国、カナダ、メキシコ)、欧州(英国、ドイツ、フランス、その他欧州)、アジア太平洋(中国、インド、日本、その他アジア太平洋)、LAMEA(中南米、中東、アフリカ)でEUVLシステムの市場動向が分析されています。
この市場で事業を展開している主な企業は、ASML、キヤノン、ニコンなどです。

ステークホルダーにとっての主なメリット
当レポートでは、2021年から2031年までの極端紫外線リソグラフィ(euvl)システム市場分析の市場セグメント、現在の動向、予測、ダイナミクスを定量的に分析し、極端紫外線リソグラフィ(euvl)システム市場の優勢な機会を特定します。
●市場調査は、主要な推進要因、阻害要因、機会に関連する情報とともに提供されます。
ポーターのファイブフォース分析により、買い手と供給者の力を明らかにし、ステークホルダーが利益重視のビジネス決定を下し、供給者と買い手のネットワークを強化できるようにします。
極端紫外線リソグラフィ(euvl)システム市場のセグメンテーションの詳細な分析は、市場機会を決定するのに役立ちます。
極端紫外線露光装置(euvl)市場の詳細な分析は、市場機会を決定するのに役立ちます。
市場プレイヤーのポジショニングは、ベンチマークを容易にし、市場プレイヤーの現在のポジションを明確に理解することができます。
地域別および世界別の極端紫外線リソグラフィ(euvl)システムの市場動向、キープレイヤー、市場セグメント、応用分野、市場成長戦略などの分析が含まれています。

主な市場セグメント
光源別
レーザー生成プラズマ(LPP)
真空スパーク
ガス放電
装置別
マスク
その他
光源
ミラー

地域別
北米
米国
カナダ
メキシコ
欧州
イギリス
ドイツ
フランス
その他の地域
アジア・パシフィック
中国
日本
インド
その他のアジア太平洋地域
LAMEA
ラテンアメリカ
中近東
アフリカ

主な市場関係者
ASML
キャノン(株)
株式会社ニコン

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目次

CHAPTER 1:INTRODUCTION
1.1.Report description
1.2.Key market segments
1.3.Key benefits to the stakeholders
1.4.Research Methodology
1.4.1.Secondary research
1.4.2.Primary research
1.4.3.Analyst tools and models
CHAPTER 2:EXECUTIVE SUMMARY
2.1.Key findings of the study
2.2.CXO Perspective
CHAPTER 3:MARKET OVERVIEW
3.1.Market definition and scope
3.2.Key findings
3.2.1.Top investment pockets
3.3.Porter’s five forces analysis
3.4.Top player positioning
3.5.Market dynamics
3.5.1.Drivers
3.5.2.Restraints
3.5.3.Opportunities
3.6.COVID-19 Impact Analysis on the market
CHAPTER 4: EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL) SYSTEMS MARKET, BY EQUIPMENT
4.1 Overview
4.1.1 Market size and forecast
4.2 Light Source
4.2.1 Key market trends, growth factors and opportunities
4.2.2 Market size and forecast, by region
4.2.3 Market analysis by country
4.3 Mirrors
4.3.1 Key market trends, growth factors and opportunities
4.3.2 Market size and forecast, by region
4.3.3 Market analysis by country
4.4 Mask
4.4.1 Key market trends, growth factors and opportunities
4.4.2 Market size and forecast, by region
4.4.3 Market analysis by country
4.5 Others
4.5.1 Key market trends, growth factors and opportunities
4.5.2 Market size and forecast, by region
4.5.3 Market analysis by country
CHAPTER 5: EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL) SYSTEMS MARKET, BY LIGHT SOURCE
5.1 Overview
5.1.1 Market size and forecast
5.2 Laser Produced Plasmas (LPP)
5.2.1 Key market trends, growth factors and opportunities
5.2.2 Market size and forecast, by region
5.2.3 Market analysis by country
5.3 Vacuum Sparks
5.3.1 Key market trends, growth factors and opportunities
5.3.2 Market size and forecast, by region
5.3.3 Market analysis by country
5.4 Gas Discharges
5.4.1 Key market trends, growth factors and opportunities
5.4.2 Market size and forecast, by region
5.4.3 Market analysis by country
CHAPTER 6: EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL) SYSTEMS MARKET, BY REGION
6.1 Overview
6.1.1 Market size and forecast
6.2 North America
6.2.1 Key trends and opportunities
6.2.2 North America Market size and forecast, by Equipment
6.2.3 North America Market size and forecast, by Light Source
6.2.4 North America Market size and forecast, by country
6.2.4.1 U.S.
6.2.4.1.1 Market size and forecast, by Equipment
6.2.4.1.2 Market size and forecast, by Light Source
6.2.4.2 Canada
6.2.4.2.1 Market size and forecast, by Equipment
6.2.4.2.2 Market size and forecast, by Light Source
6.2.4.3 Mexico
6.2.4.3.1 Market size and forecast, by Equipment
6.2.4.3.2 Market size and forecast, by Light Source
6.3 Europe
6.3.1 Key trends and opportunities
6.3.2 Europe Market size and forecast, by Equipment
6.3.3 Europe Market size and forecast, by Light Source
6.3.4 Europe Market size and forecast, by country
6.3.4.1 United Kingdom
6.3.4.1.1 Market size and forecast, by Equipment
6.3.4.1.2 Market size and forecast, by Light Source
6.3.4.2 Germany
6.3.4.2.1 Market size and forecast, by Equipment
6.3.4.2.2 Market size and forecast, by Light Source
6.3.4.3 France
6.3.4.3.1 Market size and forecast, by Equipment
6.3.4.3.2 Market size and forecast, by Light Source
6.3.4.4 Rest of Europe
6.3.4.4.1 Market size and forecast, by Equipment
6.3.4.4.2 Market size and forecast, by Light Source
6.4 Asia-Pacific
6.4.1 Key trends and opportunities
6.4.2 Asia-Pacific Market size and forecast, by Equipment
6.4.3 Asia-Pacific Market size and forecast, by Light Source
6.4.4 Asia-Pacific Market size and forecast, by country
6.4.4.1 China
6.4.4.1.1 Market size and forecast, by Equipment
6.4.4.1.2 Market size and forecast, by Light Source
6.4.4.2 Japan
6.4.4.2.1 Market size and forecast, by Equipment
6.4.4.2.2 Market size and forecast, by Light Source
6.4.4.3 India
6.4.4.3.1 Market size and forecast, by Equipment
6.4.4.3.2 Market size and forecast, by Light Source
6.4.4.4 Rest Of Asia Pacific
6.4.4.4.1 Market size and forecast, by Equipment
6.4.4.4.2 Market size and forecast, by Light Source
6.5 LAMEA
6.5.1 Key trends and opportunities
6.5.2 LAMEA Market size and forecast, by Equipment
6.5.3 LAMEA Market size and forecast, by Light Source
6.5.4 LAMEA Market size and forecast, by country
6.5.4.1 Latin America
6.5.4.1.1 Market size and forecast, by Equipment
6.5.4.1.2 Market size and forecast, by Light Source
6.5.4.2 Middle East
6.5.4.2.1 Market size and forecast, by Equipment
6.5.4.2.2 Market size and forecast, by Light Source
6.5.4.3 Africa
6.5.4.3.1 Market size and forecast, by Equipment
6.5.4.3.2 Market size and forecast, by Light Source
CHAPTER 7: COMPANY LANDSCAPE
7.1. Introduction
7.2. Top winning strategies
7.3. Product Mapping of Top 10 Player
7.4. Competitive Dashboard
7.5. Competitive Heatmap
7.6. Key developments
CHAPTER 8: COMPANY PROFILES
8.1 ASML
8.1.1 Company overview
8.1.2 Company snapshot
8.1.3 Operating business segments
8.1.4 Product portfolio
8.1.5 Business performance
8.1.6 Key strategic moves and developments
8.2 CANNON INC.
8.2.1 Company overview
8.2.2 Company snapshot
8.2.3 Operating business segments
8.2.4 Product portfolio
8.2.5 Business performance
8.2.6 Key strategic moves and developments
8.3 NIKON CORPORATION
8.3.1 Company overview
8.3.2 Company snapshot
8.3.3 Operating business segments
8.3.4 Product portfolio
8.3.5 Business performance
8.3.6 Key strategic moves and developments

 

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Summary

The extreme ultraviolet lithography systems market was valued at $8.04 billion in 2021, and is projected to reach $77.07 billion by 2031, registering a CAGR of 25.1% from 2022 to 2031. Extreme ultraviolet lithography is an optical lithography process that produces a design by exposing a reflective photomask to UV light and having it reflect onto a photoresist-covered substrate.

The growth of the EUVL system market is majorly driven by the technological superiority over other lithography techniques coupled with the rise in sale of microelectronics devices. Furthermore, the imminent requirement for size contraction in electronic devices is anticipated to drive market growth. However, complexities in developing proper photoresists and challenges in making the perfect mask are acting as a prime restraint of the market. On the contrary, the rise in trends of the Internet of Things is anticipated to provide lucrative opportunities for the expansion of the EUVL system market during the forecast period.

The extreme ultraviolet lithography systems market is segmented by equipment, light source, and region. On the basis of equipment, the market is divided into light sources, mirrors, helmets, and others. On the basis of the light sources, the market is bifurcated into laser produce plasmas (LPP), vacuum sparks, and gas discharges. Region-wise, the EUVL system market trends are analyzed across North America (the U.S., Canada, and Mexico), Europe (the UK, Germany, France, and the rest of Europe), Asia-Pacific (China, India, Japan, and the rest of the Asia-Pacific), and LAMEA (Latin America, the Middle East, and Africa).
The key players operating in the market include ASML, Canon, and Nikon.

Key Benefits For Stakeholders
●This report provides a quantitative analysis of the market segments, current trends, estimations, and dynamics of the extreme ultraviolet lithography (euvl) systems market analysis from 2021 to 2031 to identify the prevailing extreme ultraviolet lithography (euvl) systems market opportunities.
●The market research is offered along with information related to key drivers, restraints, and opportunities.
●Porter's five forces analysis highlights the potency of buyers and suppliers to enable stakeholders to make profit-oriented business decisions and strengthen their supplier-buyer network.
●In-depth analysis of the extreme ultraviolet lithography (euvl) systems market segmentation assists to determine the prevailing market opportunities.
●Major countries in each region are mapped according to their revenue contribution to the global market.
●Market player positioning facilitates benchmarking and provides a clear understanding of the present position of the market players.
●The report includes the analysis of the regional as well as global extreme ultraviolet lithography (euvl) systems market trends, key players, market segments, application areas, and market growth strategies.

Key Market Segments
By Light Source
● Laser Produced Plasmas (LPP)
● Vacuum Sparks
● Gas Discharges
By Equipment
● Mask
● Others
● Light Source
● Mirrors

By Region
● North America
○ U.S.
○ Canada
○ Mexico
● Europe
○ United Kingdom
○ Germany
○ France
○ Rest of Europe
● Asia-Pacific
○ China
○ Japan
○ India
○ Rest Of Asia Pacific
● LAMEA
○ Latin America
○ Middle East
○ Africa

● Key Market Players
○ ASML
○ CANNON INC.
○ NIKON CORPORATION



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Table of Contents

CHAPTER 1:INTRODUCTION
1.1.Report description
1.2.Key market segments
1.3.Key benefits to the stakeholders
1.4.Research Methodology
1.4.1.Secondary research
1.4.2.Primary research
1.4.3.Analyst tools and models
CHAPTER 2:EXECUTIVE SUMMARY
2.1.Key findings of the study
2.2.CXO Perspective
CHAPTER 3:MARKET OVERVIEW
3.1.Market definition and scope
3.2.Key findings
3.2.1.Top investment pockets
3.3.Porter’s five forces analysis
3.4.Top player positioning
3.5.Market dynamics
3.5.1.Drivers
3.5.2.Restraints
3.5.3.Opportunities
3.6.COVID-19 Impact Analysis on the market
CHAPTER 4: EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL) SYSTEMS MARKET, BY EQUIPMENT
4.1 Overview
4.1.1 Market size and forecast
4.2 Light Source
4.2.1 Key market trends, growth factors and opportunities
4.2.2 Market size and forecast, by region
4.2.3 Market analysis by country
4.3 Mirrors
4.3.1 Key market trends, growth factors and opportunities
4.3.2 Market size and forecast, by region
4.3.3 Market analysis by country
4.4 Mask
4.4.1 Key market trends, growth factors and opportunities
4.4.2 Market size and forecast, by region
4.4.3 Market analysis by country
4.5 Others
4.5.1 Key market trends, growth factors and opportunities
4.5.2 Market size and forecast, by region
4.5.3 Market analysis by country
CHAPTER 5: EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL) SYSTEMS MARKET, BY LIGHT SOURCE
5.1 Overview
5.1.1 Market size and forecast
5.2 Laser Produced Plasmas (LPP)
5.2.1 Key market trends, growth factors and opportunities
5.2.2 Market size and forecast, by region
5.2.3 Market analysis by country
5.3 Vacuum Sparks
5.3.1 Key market trends, growth factors and opportunities
5.3.2 Market size and forecast, by region
5.3.3 Market analysis by country
5.4 Gas Discharges
5.4.1 Key market trends, growth factors and opportunities
5.4.2 Market size and forecast, by region
5.4.3 Market analysis by country
CHAPTER 6: EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL) SYSTEMS MARKET, BY REGION
6.1 Overview
6.1.1 Market size and forecast
6.2 North America
6.2.1 Key trends and opportunities
6.2.2 North America Market size and forecast, by Equipment
6.2.3 North America Market size and forecast, by Light Source
6.2.4 North America Market size and forecast, by country
6.2.4.1 U.S.
6.2.4.1.1 Market size and forecast, by Equipment
6.2.4.1.2 Market size and forecast, by Light Source
6.2.4.2 Canada
6.2.4.2.1 Market size and forecast, by Equipment
6.2.4.2.2 Market size and forecast, by Light Source
6.2.4.3 Mexico
6.2.4.3.1 Market size and forecast, by Equipment
6.2.4.3.2 Market size and forecast, by Light Source
6.3 Europe
6.3.1 Key trends and opportunities
6.3.2 Europe Market size and forecast, by Equipment
6.3.3 Europe Market size and forecast, by Light Source
6.3.4 Europe Market size and forecast, by country
6.3.4.1 United Kingdom
6.3.4.1.1 Market size and forecast, by Equipment
6.3.4.1.2 Market size and forecast, by Light Source
6.3.4.2 Germany
6.3.4.2.1 Market size and forecast, by Equipment
6.3.4.2.2 Market size and forecast, by Light Source
6.3.4.3 France
6.3.4.3.1 Market size and forecast, by Equipment
6.3.4.3.2 Market size and forecast, by Light Source
6.3.4.4 Rest of Europe
6.3.4.4.1 Market size and forecast, by Equipment
6.3.4.4.2 Market size and forecast, by Light Source
6.4 Asia-Pacific
6.4.1 Key trends and opportunities
6.4.2 Asia-Pacific Market size and forecast, by Equipment
6.4.3 Asia-Pacific Market size and forecast, by Light Source
6.4.4 Asia-Pacific Market size and forecast, by country
6.4.4.1 China
6.4.4.1.1 Market size and forecast, by Equipment
6.4.4.1.2 Market size and forecast, by Light Source
6.4.4.2 Japan
6.4.4.2.1 Market size and forecast, by Equipment
6.4.4.2.2 Market size and forecast, by Light Source
6.4.4.3 India
6.4.4.3.1 Market size and forecast, by Equipment
6.4.4.3.2 Market size and forecast, by Light Source
6.4.4.4 Rest Of Asia Pacific
6.4.4.4.1 Market size and forecast, by Equipment
6.4.4.4.2 Market size and forecast, by Light Source
6.5 LAMEA
6.5.1 Key trends and opportunities
6.5.2 LAMEA Market size and forecast, by Equipment
6.5.3 LAMEA Market size and forecast, by Light Source
6.5.4 LAMEA Market size and forecast, by country
6.5.4.1 Latin America
6.5.4.1.1 Market size and forecast, by Equipment
6.5.4.1.2 Market size and forecast, by Light Source
6.5.4.2 Middle East
6.5.4.2.1 Market size and forecast, by Equipment
6.5.4.2.2 Market size and forecast, by Light Source
6.5.4.3 Africa
6.5.4.3.1 Market size and forecast, by Equipment
6.5.4.3.2 Market size and forecast, by Light Source
CHAPTER 7: COMPANY LANDSCAPE
7.1. Introduction
7.2. Top winning strategies
7.3. Product Mapping of Top 10 Player
7.4. Competitive Dashboard
7.5. Competitive Heatmap
7.6. Key developments
CHAPTER 8: COMPANY PROFILES
8.1 ASML
8.1.1 Company overview
8.1.2 Company snapshot
8.1.3 Operating business segments
8.1.4 Product portfolio
8.1.5 Business performance
8.1.6 Key strategic moves and developments
8.2 CANNON INC.
8.2.1 Company overview
8.2.2 Company snapshot
8.2.3 Operating business segments
8.2.4 Product portfolio
8.2.5 Business performance
8.2.6 Key strategic moves and developments
8.3 NIKON CORPORATION
8.3.1 Company overview
8.3.2 Company snapshot
8.3.3 Operating business segments
8.3.4 Product portfolio
8.3.5 Business performance
8.3.6 Key strategic moves and developments

 

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